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Drug
Resistance More Likely in NNRTI plus NRTI Regimens Compared with
Ritonavir-boosted Protease Inhibitors
By Megan Rauscher
In
the long term, there is "an appreciable" level of viral
load failure and emergence of drug resistance in HIV-infected
patients initiating potent three or four antiretroviral drug regimens
in routine clinical practice, according to UK researchers.
However,
Dr. Andrew Phillips told Reuters Health that "it looks as though
resistance emergence is more likely in those starting some regimens"
than others, in particular, non-nucleoside
reverse transcriptase inhibitors (NNRTIs) plus nucleosides
compared with ritonavir-boosted
protease inhibitors.
In
the March 25th issue of AIDS, Dr. Phillips of Royal Free
and University College Medical School, London and colleagues note
that they studied 4,306 patients initiating antiretroviral therapy
(ART) with two nucleosides plus either a single protease inhibitor (PI),
a PI with ritonavir,
abacavir, or an NNRTI.
The
overall cumulative risk of viral load failure was 38% by 6 years,
the risk of developing one or more major mutations was 27% by 6
years and the risk of mutations from at least two of the three main
drug classes was 20% over the same period.
These
findings, the researchers point out, are "lower limit estimates,"
because test results were not available for many patients with viral
load failure.
The
risk of PI mutations being detected in patients initiating a PI-containing
regimen with ritonavir was significantly lower (hazard ratio, 0.31)
than the risk of NNRTI mutations being detected in patients initiating
a NNRTI-containing regimen.
Thus
the researchers conclude patients treated in routine clinical settings
experience "relatively high levels" of ART drug resistance
over the first 6 years of therapy, despite receiving potent drug
combinations from the outset.
In
light of these findings, Dr. Phillips added that "it is important
that patients maintain complete adherence to therapy in order to
try to avoid resistance emerging."
04/25/05
AIDS
2005;19:487-494.
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